Next-Generation RF Generator

[INQ. NO. 2408M12] RFPT Co., Ltd. was established in 2010, and is a company that provides high-frequency RF power solutions for plasma required for essential processes such as plasma etching/deposition/polymerization, a core process of semiconductor manufacturing, based on RF and microwave (MW) technology.
RFPT is leading the localization of the technology in the semiconductor and defense sectors, and its major customers include global semiconductor manufacturers such as Samsung Electronics, Wonik IPS, ASM, and TEL.
RF generator is a device that generates high-frequency electromagnetic fields widely used in various industries, science, and medical fields, and is a power-supply device that supplies RF power to accurately and stably operate plasma applications used in the semiconductor core manufacturing process, etch/deposition/asher.
K-GEN generator is RFPT’s next-generation RF generator featuring the latest GaN HEMT (High Electron Mobility Transistor) technology.

Maintaining a high level of stability in RF power
In order to maintain high stability and balancing of power required in the semiconductor manufacturing processes, a newly strengthened switching-amplifier configuration and dual- step quadrature hybrid coupler were applied, and high-power efficiency was achieved by the application of GaN HEMT.

In addition, the automatic frequency-tuning function and RF vector sensor system enable accurate monitoring and control of processes required for semiconductor production processes through combination with an external RF VIZTM sensor, which can also be expected to improve yield by reducing production defects.
The device currently offers a frequency range of 2 MHz to 60 MHz and models ranging from 1.5kW to 10kW for etching, deposition, cleaning, ashing and sputtering systems in semiconductor production processes, as well as a wider range of applications and various ways to operate.

 
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